CONVEYANCE APPARATUS

Provided by the present invention is a transport apparatus capable of determining a position when transporting a wafer. The present invention comprises: a retaining plate (52) which has a retaining side (54) facing the retained side of a wafer (11); a regulating member (56) which is formed at one en...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: GO BIN, YAMADA SHOJIRO, MIKAMI KODAI
Format: Patent
Sprache:eng ; kor
Schlagworte:
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Beschreibung
Zusammenfassung:Provided by the present invention is a transport apparatus capable of determining a position when transporting a wafer. The present invention comprises: a retaining plate (52) which has a retaining side (54) facing the retained side of a wafer (11); a regulating member (56) which is formed at one end side of the retaining side and regulates the movement of the wafer to one end side by being in contact with the circumference surface of the wafer; and a transport means (58) which moves the retaining plate. The retaining side has: non-contact type suction retaining units (54a, 54b) formed to attract and retain the wafer by generating a negative pressure between the retaining side and the retained side while moving the wafer in a direction facing the regulating member by spraying fluid slantingly against the retained side of the wafer; and sets the position of the wafer to be at a predetermined position of the retaining plate by hitting the wafer on the regulating member by spraying fluid from the suction retaining units. (과제) 웨이퍼의 반송시에 위치 결정을 실시할 수 있는 반송 장치를 제공한다. (해결 수단) 웨이퍼 (11) 의 피유지면에 대면하는 유지면 (54) 을 갖는 유지판 (52) 과, 유지면의 일단측에 형성되고, 웨이퍼의 둘레면에 접촉하여 일단측으로의 웨이퍼의 이동을 규제하는 규제 부재 (56) 와, 유지판을 이동시키는 이동 수단 (58) 을 구비하고, 유지면에는, 웨이퍼의 피유지면에 대해 비스듬하게 유체를 분사하여 규제 부재로 향하는 방향으로 웨이퍼를 이동시킴과 함께, 유지면과 피유지면 사이에 부압을 발생시켜 웨이퍼를 흡인 유지하는 비접촉식의 흡인 유지부 (54a, 54b) 가 형성되어 있고, 흡인 유지부로부터 유체를 분사하여 웨이퍼를 규제 부재에 부딪치게 함으로써, 웨이퍼를 유지판의 소정의 위치에 위치 설정하도록 하였다.