IMPROVED CHAMBER CLEANING WHEN USING ACID CHEMISTRIES TO FABRICATE MICROELECTRONIC DEVICES AND PRECURSORS THEREOF
본 발명은 산성 케미스트리들로 처리되는 웨이퍼 표면들 상의 오염을 감소시키는 처리 정책들을 제공한다. 정책들은 민감성 마이크로전자 피쳐들 또는 그 전구체들을 포함하는 것들을 포함하는, 광범위한 웨이퍼들과 함께 사용하기에 적합하다. 이들 정책들은 오염의 원인일 수 있는, 다른 프로세싱 챔버 표면들로부터 뿐 아니라 워크피스(들)의 전면으로부터의 잔여 산 및 산성 부산물들을 빠르고 효과적으로 제거하는 중성화 및 린싱 정책들의 결합을 수반한다. The present invention provides treatment strategies t...
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| creator | BERG ERIK R SIEFERING KEVIN L |
| description | 본 발명은 산성 케미스트리들로 처리되는 웨이퍼 표면들 상의 오염을 감소시키는 처리 정책들을 제공한다. 정책들은 민감성 마이크로전자 피쳐들 또는 그 전구체들을 포함하는 것들을 포함하는, 광범위한 웨이퍼들과 함께 사용하기에 적합하다. 이들 정책들은 오염의 원인일 수 있는, 다른 프로세싱 챔버 표면들로부터 뿐 아니라 워크피스(들)의 전면으로부터의 잔여 산 및 산성 부산물들을 빠르고 효과적으로 제거하는 중성화 및 린싱 정책들의 결합을 수반한다.
The present invention provides treatment strategies that reduce contamination on wafer surfaces that are treated with acid chemistries. The strategies are suitable for use with a wide variety of wafers, including those including sensitive microelectronic features or precursors thereof. These strategies involve a combination of neutralizing and rinsing strategies that quickly and effectively remove residual acid and acid by-products from both the front side of workpiece(s) as well as from other processing chamber surfaces that can be causes of contamination. |
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The present invention provides treatment strategies that reduce contamination on wafer surfaces that are treated with acid chemistries. The strategies are suitable for use with a wide variety of wafers, including those including sensitive microelectronic features or precursors thereof. These strategies involve a combination of neutralizing and rinsing strategies that quickly and effectively remove residual acid and acid by-products from both the front side of workpiece(s) as well as from other processing chamber surfaces that can be causes of contamination.</description><language>eng ; kor</language><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES ; BASIC ELECTRIC ELEMENTS ; CANDLES ; CHEMISTRY ; CLEANING ; CLEANING IN GENERAL ; DETERGENT COMPOSITIONS ; DETERGENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FATTY ACIDS THEREFROM ; METALLURGY ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; RECOVERY OF GLYCEROL ; RESIN SOAPS ; SEMICONDUCTOR DEVICES ; SOAP OR SOAP-MAKING ; TRANSPORTING ; USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160718&DB=EPODOC&CC=KR&NR=20160085845A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160718&DB=EPODOC&CC=KR&NR=20160085845A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BERG ERIK R</creatorcontrib><creatorcontrib>SIEFERING KEVIN L</creatorcontrib><title>IMPROVED CHAMBER CLEANING WHEN USING ACID CHEMISTRIES TO FABRICATE MICROELECTRONIC DEVICES AND PRECURSORS THEREOF</title><description>본 발명은 산성 케미스트리들로 처리되는 웨이퍼 표면들 상의 오염을 감소시키는 처리 정책들을 제공한다. 정책들은 민감성 마이크로전자 피쳐들 또는 그 전구체들을 포함하는 것들을 포함하는, 광범위한 웨이퍼들과 함께 사용하기에 적합하다. 이들 정책들은 오염의 원인일 수 있는, 다른 프로세싱 챔버 표면들로부터 뿐 아니라 워크피스(들)의 전면으로부터의 잔여 산 및 산성 부산물들을 빠르고 효과적으로 제거하는 중성화 및 린싱 정책들의 결합을 수반한다.
The present invention provides treatment strategies that reduce contamination on wafer surfaces that are treated with acid chemistries. The strategies are suitable for use with a wide variety of wafers, including those including sensitive microelectronic features or precursors thereof. These strategies involve a combination of neutralizing and rinsing strategies that quickly and effectively remove residual acid and acid by-products from both the front side of workpiece(s) as well as from other processing chamber surfaces that can be causes of contamination.</description><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CANDLES</subject><subject>CHEMISTRY</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>DETERGENT COMPOSITIONS</subject><subject>DETERGENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FATTY ACIDS THEREFROM</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>RECOVERY OF GLYCEROL</subject><subject>RESIN SOAPS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SOAP OR SOAP-MAKING</subject><subject>TRANSPORTING</subject><subject>USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNy7sOgkAQhWEaC6O-wyTWJngN7TIM7kTYJbMLloSYtTKKwfePkPgAVucvvjOP3lxWYhvKALUqUxLAgpRhc4arJgO1m1IhT4BKdl6YHHgLuUqFUXmCklEsFYRerGGEjBrGESmTQSWEtTgr40eTkM2X0ezePYaw-u0iWufkUW9C_2rD0He38Ayf9iK7eHuK4-SYHI5q_5_6AuS6OQU</recordid><startdate>20160718</startdate><enddate>20160718</enddate><creator>BERG ERIK R</creator><creator>SIEFERING KEVIN L</creator><scope>EVB</scope></search><sort><creationdate>20160718</creationdate><title>IMPROVED CHAMBER CLEANING WHEN USING ACID CHEMISTRIES TO FABRICATE MICROELECTRONIC DEVICES AND PRECURSORS THEREOF</title><author>BERG ERIK R ; SIEFERING KEVIN L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20160085845A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2016</creationdate><topic>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CANDLES</topic><topic>CHEMISTRY</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>DETERGENT COMPOSITIONS</topic><topic>DETERGENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FATTY ACIDS THEREFROM</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>RECOVERY OF GLYCEROL</topic><topic>RESIN SOAPS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SOAP OR SOAP-MAKING</topic><topic>TRANSPORTING</topic><topic>USE OF SINGLE SUBSTANCES AS DETERGENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>BERG ERIK R</creatorcontrib><creatorcontrib>SIEFERING KEVIN L</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BERG ERIK R</au><au>SIEFERING KEVIN L</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>IMPROVED CHAMBER CLEANING WHEN USING ACID CHEMISTRIES TO FABRICATE MICROELECTRONIC DEVICES AND PRECURSORS THEREOF</title><date>2016-07-18</date><risdate>2016</risdate><abstract>본 발명은 산성 케미스트리들로 처리되는 웨이퍼 표면들 상의 오염을 감소시키는 처리 정책들을 제공한다. 정책들은 민감성 마이크로전자 피쳐들 또는 그 전구체들을 포함하는 것들을 포함하는, 광범위한 웨이퍼들과 함께 사용하기에 적합하다. 이들 정책들은 오염의 원인일 수 있는, 다른 프로세싱 챔버 표면들로부터 뿐 아니라 워크피스(들)의 전면으로부터의 잔여 산 및 산성 부산물들을 빠르고 효과적으로 제거하는 중성화 및 린싱 정책들의 결합을 수반한다.
The present invention provides treatment strategies that reduce contamination on wafer surfaces that are treated with acid chemistries. The strategies are suitable for use with a wide variety of wafers, including those including sensitive microelectronic features or precursors thereof. These strategies involve a combination of neutralizing and rinsing strategies that quickly and effectively remove residual acid and acid by-products from both the front side of workpiece(s) as well as from other processing chamber surfaces that can be causes of contamination.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY CLEANING CLEANING IN GENERAL DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING TRANSPORTING USE OF SINGLE SUBSTANCES AS DETERGENTS |
| title | IMPROVED CHAMBER CLEANING WHEN USING ACID CHEMISTRIES TO FABRICATE MICROELECTRONIC DEVICES AND PRECURSORS THEREOF |
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