TRANSPARENT GAS BARRIER FILM AND METHOD FOR MANUFACTURING TRANSPARENT GAS BARRIER FILM

Disclosed are a transparent gas blocking film, and a method for manufacturing the same. According to an aspect of the present invention, the transparent gas blocking film comprises: a base substrate; a first stress relieving layer composed of an organic film, and relieving stresses, wherein the firs...

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Bibliographische Detailangaben
Hauptverfasser: KIM, KYUNG KAK, KIM, TAE HYUN, AN, JOONG KYU, BANG, SUNG HWAN
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:Disclosed are a transparent gas blocking film, and a method for manufacturing the same. According to an aspect of the present invention, the transparent gas blocking film comprises: a base substrate; a first stress relieving layer composed of an organic film, and relieving stresses, wherein the first stress relieving layer is positioned on an upper part of the base substrate; a main barrier layer composed of an organic film, and relieving stresses, wherein the main barrier layer is positioned on an upper part of the first stress relieving layer; and a second stress relieving layer composed of an organic film, and relieving stresses, wherein the second stress relieving layer is positioned on an upper part of the main barrier layer. The transparent gas blocking film has excellent characteristics of preventing permeation of moisture, and can reduce possibility of generating cracks. 본 발명은 투명 가스 배리어성 필름 및 이를 제조하는 방법을 개시한다. 본 발명의 일 측면에 따른 투명 가스 배리어성 필름은, 베이스 기재; 상기 베이스 기재의 상부에 위치하여 응력을 완화하는 역할을 하는 유기막으로 이루어진 제 1 응력 완화층; 상기 제 1 응력 완화층의 상부에 위치하여 주 배리어층 역할을 하는 무기막으로 이루어진 메인 배리어층; 및 상기 메인 배리어층의 상부에 위치하여 응력을 완화하는 역할을 하는 유기막으로 이루어진 제 2 응력 완화층;을 포함한다.