TRANSPARENT GAS BARRIER FILM AND METHOD FOR MANUFACTURING TRANSPARENT GAS BARRIER FILM

Disclosed in the present invention are a transparent gas barrier film and a method for fabricating the same. According to one aspect of the present invention, the transparent gas barrier film includes: a base substrate; a first barrier layer disposed on the base substrate to prevent moisture from be...

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Bibliographische Detailangaben
Hauptverfasser: KIM, KYUNG KAK, SHIN, CHUNG HWAN, KIM, TAE HYUN
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:Disclosed in the present invention are a transparent gas barrier film and a method for fabricating the same. According to one aspect of the present invention, the transparent gas barrier film includes: a base substrate; a first barrier layer disposed on the base substrate to prevent moisture from being infiltrated into the base substrate; an adhesive layer disposed on the first barrier layer to bond the first barrier layer to a second barrier layer, and formed of an organic material; and the second barrier layer disposed on the adhesive layer to prevent moisture, which is additionally produced, from being infiltrated into the adhesive layer. The second barrier layer is formed of an inorganic material having a hydrophobic property. According to one aspect of the present invention, an inorganic layer having the hydrophobic property is provided on the base substrate to effectively prevent moisture in air from being introduced. 본 발명은 투명 가스 배리어성 필름 및 이를 제조하는 방법을 개시한다. 본 발명의 일 측면에 따른 투명 가스 배리어성 필름은, 베이스 기재; 상기 베이스 기재의 상부에 위치하여 수분의 침투를 방지하는 제 1 배리어층; 상기 제 1 배리어층의 상부에 위치하여 상기 제 1 배리어층과 제 2 배리어층을 접착시키는 역할을 하는 유기물로 이루어진 접착층; 및 상기 접착층의 상부에 위치하여 추가적으로 발생할 수 있는 수분의 침투를 방지하는 역할을 하는 제 2 배리어층;을 포함하고, 상기 제 2 배리어층은 소수성을 갖는 무기물로 이루어진다.