SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

The present invention relates to a semiconductor element and a manufacturing method thereof. The method includes the steps of: forming a sacrificial gate pattern on a substrate; forming a first spacer exposing an upper part of a side wall of the sacrificial gate pattern on the side wall; covering th...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: KOO, KYUNG BUM, ZULKARNAIN, LEE, JEONG KYU, LEE, SEUNG JAE, KIM, SHIN HYE, OH,RAE
Format: Patent
Sprache:eng ; kor
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!