METHOD FOR ACCURATELY DETERMINING THE THICKNESS AND/OR ELEMENTAL COMPOSITION OF SMALL FEATURES ON THIN-SUBSTRATES USING MICRO-XRF

An XRF analysis method includes a step of orienting an x-ray beam to a specimen and measuring an XRF signal excited from a specimen to generate a reference XRF spectrum and a target XRF spectrum, in reference measurement including one or more first layers wherein the specimen is formed on a base mat...

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Bibliographische Detailangaben

Hauptverfasser:	OSTROVSKY OLGA, MAZOR ISAAC, TOKAR ALEX, ATRASH FOUAD
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MEASUREMENT OF NUCLEAR OR X-RADIATION MEASURING PHYSICS SEMICONDUCTOR DEVICES TESTING
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