PHOTOSENSITIVE RESIN COMPOSITION

The present invention relates to a photosensitive resin composition, and more specifically, to a photosensitive resin composition providing a cured film increasing curability during exposure, and having excellent chemical resistance and resolution even in a low temperature process at a temperature e...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PARK, JIN KYU, LIM, CHOUL KYU, HONG, MYUNG SUN, CHA, HYUK JIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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