APPARATUS FOR PROCESSING SUBSTRATE WITH HEATER ADJUSTING PROCESS SPACE TEMPERATURE ACCORDING TO HEIGHT

According to an embodiment of the present invention, a substrate processing apparatus to perform a process on the substrate, includes: a lower chamber which has an opened upper part and a path for inputting/outputting the substrate on a side; an external reaction tube which closes the opened upper p...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIM, YONG KI, SONG, BYOUNG GYU, HYON, JUN JIN, SHIN, YANG SIK, KIM, CHANG DOL, KIM, KYONG HUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!