APPARATUS FOR PROCESSING SUBSTRATE WITH HEATER ADJUSTING PROCESS SPACE TEMPERATURE ACCORDING TO HEIGHT

According to an embodiment of the present invention, a substrate processing apparatus to perform a process on the substrate, includes: a lower chamber which has an opened upper part and a path for inputting/outputting the substrate on a side; an external reaction tube which closes the opened upper part of the lower chamber, and provides a process space for the process; a substrate holder which vertically loads at least one substrate, and can be moved from a loading position for loading the substrate in the substrate holder to a process position for performing the process on the substrate; and a gas supply unit which is installed in the external reaction tube, supplies reaction gas to the process space, and forms the flow of the reaction gas with different phase difference in a vertical direction.