PHOTOSENSITIVE PASTE COMPOSITION FOR FORMING TRANSPARENT ELETRODE OF METAL MESH STRUCTURE AND ELECTRODE FABRICATED USING THE SAME

The present invention discloses a photosensitive paste composition for preparing a transparent electrode having a metal mesh structure and the electrode prepared by using the same. According to an embodiment of the present invention, the photosensitive paste composition includes: 50 to 85 wt% of con...

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Bibliographische Detailangaben
Hauptverfasser:	CHOI, HAK YEOL, KIM, BEOM JOON, CHO, MI JEONG, LEE, JOUNG HAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention discloses a photosensitive paste composition for preparing a transparent electrode having a metal mesh structure and the electrode prepared by using the same. According to an embodiment of the present invention, the photosensitive paste composition includes: 50 to 85 wt% of conductive metals; 3 to 30 wt% of a binder resin; 0.1 to 2 wt% of a photo-initiator agent; and 5 to 30 wt% of a solvent. Metal Mesh 구조의 투명전극 형성용 감광성 페이스트 조성물 및 이를 이용하여 제조된 전극이 개시된다. 본 발명의 일 구현예에 따른 Metal Mesh 구조의 투명전극 형성용 감광성 페이스트 조성물은 50 내지 85 중량%의 도전성 금속과, 3 내지 30 중량%의 바인더 수지와, 0.1 내지 2 중량%의 광경화 개시제, 및 5 내지 30 중량%의 용제를 포함한다.