EVAPORATING APPARATUS, METHOD FOR CONTROLLING EVAPORATION AMOUNT USING THE SAME

According to an embodiment of the present invention, an evaporation apparatus includes: a vacuum chamber; an evaporation source disposed inside the vacuum chamber to emit vaporized deposits; and an evaporation amount calculation unit to provide energy for the vaporized deposits to emit fluorescence...

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Bibliographische Detailangaben
Hauptverfasser:	PARK, GAN YOUNG, CHOI, HYUN, LEE, BYUNG CHUL, LEE, CHANG SIK, JEONG, HEUNG CHEOL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	According to an embodiment of the present invention, an evaporation apparatus includes: a vacuum chamber; an evaporation source disposed inside the vacuum chamber to emit vaporized deposits; and an evaporation amount calculation unit to provide energy for the vaporized deposits to emit fluorescence from the vaporized deposits and to calculate the vaporized amount of the vaporized deposits based on the strength of the fluorescence emission. 본 발명의 일 실시예에 따른 증착 장치는 진공 챔버, 진공 챔버 내부에 배치되고, 기화된 증착물을 방출하는 증착원, 및 기화된 증착물로부터 형광이 방출되도록 기화된 증착물에 에너지를 제공하고, 방출된 형광의 세기에 근거하여 기화된 증착물의 기화량을 산출하는 기화량 산출 유닛을 포함한다.