CHUCK TABLE APPARATUS
A chuck table apparatus is disclosed. According to the present invention, the chuck table apparatus comprises: a rotary table where a wafer is loaded; a rotary member disposed on the rotary table and disposed to be concentric with the center of rotation of the rotary table; a drive unit coupled to t...
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| creator | PARK, JI HO LEE, HYUN JAE KIM, TAE HOON MO, SUNG WON JUNG, SEOK JUN CHOI, MUN SUP LEE, SEUNG HOON |
| description | A chuck table apparatus is disclosed. According to the present invention, the chuck table apparatus comprises: a rotary table where a wafer is loaded; a rotary member disposed on the rotary table and disposed to be concentric with the center of rotation of the rotary table; a drive unit coupled to the rotary member and rotating the rotary member; a plurality of link units hinged to the rotary table and hinged to the rotary member; a moving rod coupled to each link unit and moved by the link unit; a guide unit fixated to the rotary table and where the moving rod is coupled to be moved; and a chuck fin coupled to the moving rod and moved to a waiting position or a supporting position supporting a circumferential part of the wafer in accordance with the moving rod moves.
척테이블 장치에 대한 발명이 개시된다. 본 발명의 척테이블 장치는: 웨이퍼가 로딩되는 회전 테이블; 회전 테이블에 배치되고, 회전 테이블의 회전 중심과 동심을 이루도록 배치되는 회전 부재; 회전 부재에 결합되어 회전 부재를 회전시키는 구동부; 회전 테이블에 힌지 결합되고, 회전 부재에 힌지 결합되는 복수의 링크부; 각 링크부에 결합되어 링크부에 의해 이동되는 이동 로드; 회전 테이블에 고정되고, 이동 로드가 이동 가능하게 결합되는 가이드부; 및 이동 로드에 결합되고, 이동 로드가 이동됨에 따라 웨이퍼의 둘레부를 지지하는 지지 위치 또는 대기 위치로 이동되는 척핀을 포함하는 것을 특징으로 한다. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20150056999A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20150056999A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20150056999A3</originalsourceid><addsrcrecordid>eNrjZBB19gh19lYIcXTycVVwDAhwDHIMCQ3mYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx3kFGBoamBgamZpaWlo7GxKkCAAZhH7s</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CHUCK TABLE APPARATUS</title><source>esp@cenet</source><creator>PARK, JI HO ; LEE, HYUN JAE ; KIM, TAE HOON ; MO, SUNG WON ; JUNG, SEOK JUN ; CHOI, MUN SUP ; LEE, SEUNG HOON</creator><creatorcontrib>PARK, JI HO ; LEE, HYUN JAE ; KIM, TAE HOON ; MO, SUNG WON ; JUNG, SEOK JUN ; CHOI, MUN SUP ; LEE, SEUNG HOON</creatorcontrib><description>A chuck table apparatus is disclosed. According to the present invention, the chuck table apparatus comprises: a rotary table where a wafer is loaded; a rotary member disposed on the rotary table and disposed to be concentric with the center of rotation of the rotary table; a drive unit coupled to the rotary member and rotating the rotary member; a plurality of link units hinged to the rotary table and hinged to the rotary member; a moving rod coupled to each link unit and moved by the link unit; a guide unit fixated to the rotary table and where the moving rod is coupled to be moved; and a chuck fin coupled to the moving rod and moved to a waiting position or a supporting position supporting a circumferential part of the wafer in accordance with the moving rod moves.
척테이블 장치에 대한 발명이 개시된다. 본 발명의 척테이블 장치는: 웨이퍼가 로딩되는 회전 테이블; 회전 테이블에 배치되고, 회전 테이블의 회전 중심과 동심을 이루도록 배치되는 회전 부재; 회전 부재에 결합되어 회전 부재를 회전시키는 구동부; 회전 테이블에 힌지 결합되고, 회전 부재에 힌지 결합되는 복수의 링크부; 각 링크부에 결합되어 링크부에 의해 이동되는 이동 로드; 회전 테이블에 고정되고, 이동 로드가 이동 가능하게 결합되는 가이드부; 및 이동 로드에 결합되고, 이동 로드가 이동됨에 따라 웨이퍼의 둘레부를 지지하는 지지 위치 또는 대기 위치로 이동되는 척핀을 포함하는 것을 특징으로 한다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150528&DB=EPODOC&CC=KR&NR=20150056999A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150528&DB=EPODOC&CC=KR&NR=20150056999A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PARK, JI HO</creatorcontrib><creatorcontrib>LEE, HYUN JAE</creatorcontrib><creatorcontrib>KIM, TAE HOON</creatorcontrib><creatorcontrib>MO, SUNG WON</creatorcontrib><creatorcontrib>JUNG, SEOK JUN</creatorcontrib><creatorcontrib>CHOI, MUN SUP</creatorcontrib><creatorcontrib>LEE, SEUNG HOON</creatorcontrib><title>CHUCK TABLE APPARATUS</title><description>A chuck table apparatus is disclosed. According to the present invention, the chuck table apparatus comprises: a rotary table where a wafer is loaded; a rotary member disposed on the rotary table and disposed to be concentric with the center of rotation of the rotary table; a drive unit coupled to the rotary member and rotating the rotary member; a plurality of link units hinged to the rotary table and hinged to the rotary member; a moving rod coupled to each link unit and moved by the link unit; a guide unit fixated to the rotary table and where the moving rod is coupled to be moved; and a chuck fin coupled to the moving rod and moved to a waiting position or a supporting position supporting a circumferential part of the wafer in accordance with the moving rod moves.
척테이블 장치에 대한 발명이 개시된다. 본 발명의 척테이블 장치는: 웨이퍼가 로딩되는 회전 테이블; 회전 테이블에 배치되고, 회전 테이블의 회전 중심과 동심을 이루도록 배치되는 회전 부재; 회전 부재에 결합되어 회전 부재를 회전시키는 구동부; 회전 테이블에 힌지 결합되고, 회전 부재에 힌지 결합되는 복수의 링크부; 각 링크부에 결합되어 링크부에 의해 이동되는 이동 로드; 회전 테이블에 고정되고, 이동 로드가 이동 가능하게 결합되는 가이드부; 및 이동 로드에 결합되고, 이동 로드가 이동됨에 따라 웨이퍼의 둘레부를 지지하는 지지 위치 또는 대기 위치로 이동되는 척핀을 포함하는 것을 특징으로 한다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBB19gh19lYIcXTycVVwDAhwDHIMCQ3mYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx3kFGBoamBgamZpaWlo7GxKkCAAZhH7s</recordid><startdate>20150528</startdate><enddate>20150528</enddate><creator>PARK, JI HO</creator><creator>LEE, HYUN JAE</creator><creator>KIM, TAE HOON</creator><creator>MO, SUNG WON</creator><creator>JUNG, SEOK JUN</creator><creator>CHOI, MUN SUP</creator><creator>LEE, SEUNG HOON</creator><scope>EVB</scope></search><sort><creationdate>20150528</creationdate><title>CHUCK TABLE APPARATUS</title><author>PARK, JI HO ; LEE, HYUN JAE ; KIM, TAE HOON ; MO, SUNG WON ; JUNG, SEOK JUN ; CHOI, MUN SUP ; LEE, SEUNG HOON</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20150056999A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2015</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>PARK, JI HO</creatorcontrib><creatorcontrib>LEE, HYUN JAE</creatorcontrib><creatorcontrib>KIM, TAE HOON</creatorcontrib><creatorcontrib>MO, SUNG WON</creatorcontrib><creatorcontrib>JUNG, SEOK JUN</creatorcontrib><creatorcontrib>CHOI, MUN SUP</creatorcontrib><creatorcontrib>LEE, SEUNG HOON</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PARK, JI HO</au><au>LEE, HYUN JAE</au><au>KIM, TAE HOON</au><au>MO, SUNG WON</au><au>JUNG, SEOK JUN</au><au>CHOI, MUN SUP</au><au>LEE, SEUNG HOON</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CHUCK TABLE APPARATUS</title><date>2015-05-28</date><risdate>2015</risdate><abstract>A chuck table apparatus is disclosed. According to the present invention, the chuck table apparatus comprises: a rotary table where a wafer is loaded; a rotary member disposed on the rotary table and disposed to be concentric with the center of rotation of the rotary table; a drive unit coupled to the rotary member and rotating the rotary member; a plurality of link units hinged to the rotary table and hinged to the rotary member; a moving rod coupled to each link unit and moved by the link unit; a guide unit fixated to the rotary table and where the moving rod is coupled to be moved; and a chuck fin coupled to the moving rod and moved to a waiting position or a supporting position supporting a circumferential part of the wafer in accordance with the moving rod moves.
척테이블 장치에 대한 발명이 개시된다. 본 발명의 척테이블 장치는: 웨이퍼가 로딩되는 회전 테이블; 회전 테이블에 배치되고, 회전 테이블의 회전 중심과 동심을 이루도록 배치되는 회전 부재; 회전 부재에 결합되어 회전 부재를 회전시키는 구동부; 회전 테이블에 힌지 결합되고, 회전 부재에 힌지 결합되는 복수의 링크부; 각 링크부에 결합되어 링크부에 의해 이동되는 이동 로드; 회전 테이블에 고정되고, 이동 로드가 이동 가능하게 결합되는 가이드부; 및 이동 로드에 결합되고, 이동 로드가 이동됨에 따라 웨이퍼의 둘레부를 지지하는 지지 위치 또는 대기 위치로 이동되는 척핀을 포함하는 것을 특징으로 한다.</abstract><oa>free_for_read</oa></addata></record> |
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| title | CHUCK TABLE APPARATUS |
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