APPARATUS FOR CLEANING A SUBSTRATE

The present invention provides an apparatus for cleaning a substrate comprises: a substrate convey unit supporting a substrate at a perpendicular tilt angle with respect to a first direction and conveying the substrate toward a second direction which is orthogonal to the first direction; and a clean...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	JANG, SEOK JUN, JEON, YANG IL, KIM, BONG KYUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CLEANING CLEANING IN GENERAL PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention provides an apparatus for cleaning a substrate comprises: a substrate convey unit supporting a substrate at a perpendicular tilt angle with respect to a first direction and conveying the substrate toward a second direction which is orthogonal to the first direction; and a cleaning unit installed on the substrate convey unit and having a plurality of twin-fluid nozzles. The cleaning unit having a horizontal tilt angle with respect to the first direction, and the twin-fluid nozzle enables a cleaning solution and a compressed gas to be mixed and injected. 제 1 방향에 대하여 수직 경사각으로 기판을 지지하며, 상기 제 1 방향과 직교하는 제 2 방향으로 기판을 이송하는 기판 이송 유닛 및 상기 기판 이송 유닛 상에 설치되며, 복수개의 이류체 노즐이 구비된 세정 유닛을 포함하며, 상기 세정 유닛은 상기 제 1 방향에 대하여 수평 경사각을 갖고, 상기 이류체 노즐은 세정액과 압축가스를 혼합하여 분사하는 기판 세정 장치를 제공한다.