Door Being Used for Heat Treatment Chamber of Substrates, and Heat Treatment Chamber and Apparatus of Substrate Having the Same

In the present invention, disclosed are a door used for a heat treatment chamber for a substrate, a heat treatment chamber for the substrate and a heat treatment apparatus for the substrate including the same. The door used for the heat treatment chamber for the substrate according to the present invention includes: a shutter plate which is opened and closed in a top housing and a bottom housing of the heat treatment chamber for the substrate, a rotation shaft to which the shutter plate is rotationally fixed, a fixing block which is provided in the inner side of the shutter plate, a door heater which is fixed and mounted on the fixing block, multiple coupling members which fix and mount the fixing block to the shutter plate, and an inner shutter cover which surrounds the door heater and the fixing block.