NEW POLYMER AND COMPOSITIONS CONTAINING IT
The present invention relates to a novel polymer, which is widely used, and a composition including the same wherein the polymer and composition are used for manufacturing a semi-conductor device with outstanding mechanical and optical properties. In the manufacturing process of the composition and...
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Format: | Patent |
Sprache: | eng ; kor |
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Zusammenfassung: | The present invention relates to a novel polymer, which is widely used, and a composition including the same wherein the polymer and composition are used for manufacturing a semi-conductor device with outstanding mechanical and optical properties. In the manufacturing process of the composition and the polymer, specifically, a solution process and a spin process are made, leading to a simple process. In the present invention, provide is a novel polymer with good etching selectivity ratio wherein the polymer of the present invention is denoted by chemical formula 1 or chemical formula 2. In addition, the polymer and the composition can be manufactured in a simple process. |
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