NEW POLYMER AND COMPOSITIONS CONTAINING IT

The present invention relates to a novel polymer, which is widely used, and a composition including the same wherein the polymer and composition are used for manufacturing a semi-conductor device with outstanding mechanical and optical properties. In the manufacturing process of the composition and...

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Bibliographische Detailangaben
Hauptverfasser: SHIN, MIN CHUL, LEE, SANG ICK, JUNG, IN KYUNG, BYUN, TAE SEOK, KWONE, YONG HEE, RYOU, JOON SUNG, KIM, SANG TAI, SON, SEUNG, PARK, JOO HYEON, KIM, MYONG WOON
Format: Patent
Sprache:eng ; kor
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Beschreibung
Zusammenfassung:The present invention relates to a novel polymer, which is widely used, and a composition including the same wherein the polymer and composition are used for manufacturing a semi-conductor device with outstanding mechanical and optical properties. In the manufacturing process of the composition and the polymer, specifically, a solution process and a spin process are made, leading to a simple process. In the present invention, provide is a novel polymer with good etching selectivity ratio wherein the polymer of the present invention is denoted by chemical formula 1 or chemical formula 2. In addition, the polymer and the composition can be manufactured in a simple process.