TEXTURE ETCHING SOLUTION COMPOSITION AND TEXTURE ETCHING METHOD OF CRYSTALLINE SILICON WAFERS

The present invention relates to a texture etching solution composition for crystalline silicon wafers, and to a texture etching method. More specifically, the present invention relates to a texture etching solution composition for crystalline silicon wafers, which comprises an alkali compound and a water soluble glucan compound with the degree of polymerization of 1,000 or less, wherein the water soluble glucan compound includes water soluble glucan-based compounds, which are polymerized with glucose substituted with alkyl carboxyl group having 1-3 carbons or a metal salt thereof, wherein the total degree of substitution of the carboxyl group or a metal salt thereof is 0.5-1.2. When a fine pyramid structure is formed on the surface of a crystalline silicon wafer, the difference of etching speed with regard to the silicon crystal direction is controlled to prevent over-etching by the alkali compound and to minimize the quality difference of the texture according to the position, thereby improving optical efficiency.