SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND COMPUTER-READABLE STORAGE MEDIUM RECORDING THEREIN SUBSTRATE PROCESSING PROGRAM

The present invention is provided to improve a throughput in processing a substrate and to reduce a running cost thereof. A substrate processing apparatus (1) that processes a substrate (3) with a processing liquid and dries the substrate (3) includes: a substrate rotating device (22) configured to...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: OOISHI KOTARO, KAWANO HISASHI, TANAKA SATORU, KAWABUCHI YOSUKE, SUZUKI HIROYUKI, YOSHIDA YUKI, SHINOHARA KAZUYOSHI
Format: Patent
Sprache:eng ; kor
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The present invention is provided to improve a throughput in processing a substrate and to reduce a running cost thereof. A substrate processing apparatus (1) that processes a substrate (3) with a processing liquid and dries the substrate (3) includes: a substrate rotating device (22) configured to rotate the substrate (3); a processing liquid discharging unit (13) configured to discharge the processing liquid toward the substrate (3); a substitution liquid discharging unit (14) configured to discharge a substitution liquid, which is substituted with the processing liquid on the substrate (3), toward the substrate 3 while relatively moving with respect to the substrate (3); and an inert gas discharging unit (15) configured to discharge an inert gas toward a peripheral portion of the substrate (3) in an inclined direction from above the substrate (3) while moving in a direction different from a moving direction of the substitution liquid discharging unit (14).