CHEMICAL VAPOR DEPOSITION APPARATUS

According to an embodiment of the present invention, a chemical vapor deposition apparatus comprises: a body unit which has a plurality of accommodating grooves on one surface and a supporting rod on the other surface and is arranged in a response chamber; pocket units rotationally arranged in each...

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Hauptverfasser: KIM, CHOO HO, JI, WON SOO, HUR, IN HOE, KIM, JUN WOO
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creator KIM, CHOO HO
JI, WON SOO
HUR, IN HOE
KIM, JUN WOO
description According to an embodiment of the present invention, a chemical vapor deposition apparatus comprises: a body unit which has a plurality of accommodating grooves on one surface and a supporting rod on the other surface and is arranged in a response chamber; pocket units rotationally arranged in each accommodation groove; an operation gas supply unit which supplies operation gas into the accommodation grooves through the supporting rod to rotate the pocket unit; and a heating unit which supplies heat to the operation gas flowing in the operation gas supply unit by heating the operation gas supply unit.
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title CHEMICAL VAPOR DEPOSITION APPARATUS
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