CHEMICAL VAPOR DEPOSITION APPARATUS

According to an embodiment of the present invention, a chemical vapor deposition apparatus comprises: a body unit which has a plurality of accommodating grooves on one surface and a supporting rod on the other surface and is arranged in a response chamber; pocket units rotationally arranged in each...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, CHOO HO, JI, WON SOO, HUR, IN HOE, KIM, JUN WOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	According to an embodiment of the present invention, a chemical vapor deposition apparatus comprises: a body unit which has a plurality of accommodating grooves on one surface and a supporting rod on the other surface and is arranged in a response chamber; pocket units rotationally arranged in each accommodation groove; an operation gas supply unit which supplies operation gas into the accommodation grooves through the supporting rod to rotate the pocket unit; and a heating unit which supplies heat to the operation gas flowing in the operation gas supply unit by heating the operation gas supply unit.