RINSE SOLUTION FOR POLYHYDROSILOXAZANE THIN FILM AND METHOD OF PATTERNING POLYHYDROSILOXAZANE THIN FILM USING THE SAME

The present invention relates to a rinse solution for a polyhydrosiloxazane thin film comprising: a first solvent including aliphatic hydrocarbon of C8-C20 or a mixture thereof; and a second solvent including aromatic hydrocarbon of C7-C20 or a mixture thereof, wherein a weight ratio of the first so...

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Bibliographische Detailangaben
Hauptverfasser:	LEE, HAN SONG, PARK, EUN SU, KIM, SANG KYUN, KIM, GO UN, LIM, SANG HAK, LIM, WAN HEE
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	The present invention relates to a rinse solution for a polyhydrosiloxazane thin film comprising: a first solvent including aliphatic hydrocarbon of C8-C20 or a mixture thereof; and a second solvent including aromatic hydrocarbon of C7-C20 or a mixture thereof, wherein a weight ratio of the first solvent and the second solvent is 60:40 to 90:10.