METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

Provided is a method for fabricating a semiconductor device which improves a metallization process for forming an upper line by removing a metal hard mask used for a process for forming the upper line before a lower line is opened. The method for fabricating a semiconductor device includes forming a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KO, DONG WHAN, SON, SAE IL, SHIN, HONG JAE, KIM, JONG SAM, BOK, SEUNG IL, JANG, WOO JIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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