METHOD OF TREATING A SURFACE AND CERAMIC STRUCTURE USEOF

METHOD OF TREATING A SURFACE AND CERAMIC STRUCTURE USEOF

In a method of treating a surface, a low hardness ceramic coating layer having a first hardness is formed on a basic material. A plasma process is performed on the upper surface of the low hardness ceramic coating layer by using a plasma torch. The upper part of the low hardness ceramic coating laye...

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Bibliographische Detailangaben
Hauptverfasser: MOON, JANG WON, YE, KYUNG HWAN, SHIN, DONG HEE, JANG, KYUNG IC, JUNG, CHAE JONG
Format: Patent
Sprache:eng ; kor
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:In a method of treating a surface, a low hardness ceramic coating layer having a first hardness is formed on a basic material. A plasma process is performed on the upper surface of the low hardness ceramic coating layer by using a plasma torch. The upper part of the low hardness ceramic coating layer is changed into a ceramic coating layer having a second hardness which is higher than the first hardness. Next, the upper surface of the ceramic coating layer is polished to have the surface roughness of 0.05 to 1.00 micrometer.