VACUUM EVAPORATION APPARATUS AND VACUUM EVAPORATION METHOD

The present invention relates to a vacuum evaporation apparatus capable of uniformly forming the whole thickness of an organic EL layer. In order to accomplish the objective of the present invention, the vacuum evaporation apparatus includes a guide path for transferring an evaporation material obta...

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1. Verfasser: DAIKU HIROYUKI
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:The present invention relates to a vacuum evaporation apparatus capable of uniformly forming the whole thickness of an organic EL layer. In order to accomplish the objective of the present invention, the vacuum evaporation apparatus includes a guide path for transferring an evaporation material obtained from an evaporation source, and a discharge member for discharging the evaporation material introduced from the guide path to a target deposition member. The discharging member includes a dispersion container (7) for diffusing the evaporation material, and a plurality of nozzle members (8) protruding toward the target deposition member and having a front end portion thereof with an iris opening to discharge the evaporation material to the target deposition member. Each nozzle member (8) has an inner diameter (D) and a length (L) thereof, and a diameter (D′) of the iris opening (8a). Each discharging member has a unit (13) for regulating the flow rate of the evaporation material in the nozzle member (8) so that the flow rate of the evaporation material in the nozzle member (8) has a predetermined value. The inner diameter (D) mm, and the length (L) mm of the nozzle member (8), and the diameter (D′) mm of the iris opening satisfy an equation, L >= 9D and D′