SYSTEM AND METHOD FOR TUNGSTEN HEXAFLUORIDE RECOVERY AND REUSE

Condensable materials, such as but not limited to, tungsten hexafluoride (WF6) can be used for depositing a film in a chemical vapor deposition (CVD) process. In the present invention, disclosed is a method for collecting and reusing the materials rather than treating the condensable materials which...

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Bibliographische Detailangaben
Hauptverfasser:	LEHMANN JOHN FRANCIS, CASTEEL JR. WILLIAM JACK, KARWACKI JR. EUGENE JOSEPH, AHN, HEUI BOK, WINCHESTER DAVID CHARLES, AGARWAL RAJIV KRISHAN, JOHNSON ANDREW DAVID
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SEPARATION SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	Condensable materials, such as but not limited to, tungsten hexafluoride (WF6) can be used for depositing a film in a chemical vapor deposition (CVD) process. In the present invention, disclosed is a method for collecting and reusing the materials rather than treating the condensable materials which are not reacted in a production process as waste. In one concrete embodiment, when the condensable materials such as gaseous WF6 are not supplied to a CVD reactor, the condensable materials are induced to a collection cabinet for capturing.