ETCHING APPARATUS OF SUBSTRATE AND METHOD OF ETCHING USING THE SAME

A liquid crystal display device comprises a receiving container which receives a substrate and includes a through hole on the bottom thereof, through which etchant is discharged, and four sidewalls for containing the etchant; and a first spray unit which is arranged on the upper side of the receivin...

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Bibliographische Detailangaben
Hauptverfasser:	SHIN, MIN KYU, PARK, PYOUNG KYU, PARK, WOO YOUL, YOO, HAE YOUNG, SHIN, JUNG KUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	A liquid crystal display device comprises a receiving container which receives a substrate and includes a through hole on the bottom thereof, through which etchant is discharged, and four sidewalls for containing the etchant; and a first spray unit which is arranged on the upper side of the receiving container and supplies the etchant to the receiving container. The receiving container further includes an opening and closing driving unit which opens and closes the through hole on the bottom. The first spray unit includes a supply pipe to receive the etchant and a plurality of spray nozzles which are connected to the supply pipe and face the bottom of the receiving container. Therefore, the uniformity and effect of an etching process are improved by etching using a flow rate generated in the receiving container.