MICROWAVE RADIATION ANTENNA, MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS

Provided are a microwave radiation antenna, a microwave plasma source and plasma processing apparatus which uniformly form plasma while suppressing the power loss and abnormal discharge of microwave. A microwave radiation antenna (45) of the present invention to radiate microwave into a chamber tran...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KOMATSU TOMOHITO, OSADA YUKI, FUJINO YUTAKA, MIYASHITA HIROYUKI, TANIHARA AKIRA, KASAI SHIGERU, IKEDA TARO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:	Provided are a microwave radiation antenna, a microwave plasma source and plasma processing apparatus which uniformly form plasma while suppressing the power loss and abnormal discharge of microwave. A microwave radiation antenna (45) of the present invention to radiate microwave into a chamber transmitted along a microwave transmission line and generate surface wave plasma includes an antenna body (121) which is formed with a conductor; a process gas introduction hole (124) formed in the antenna body (121); a gas diffusion space (123); a plurality of gas outlet holes (125); a plurality of slots (122) formed corresponding to the microwave transmission line in the antenna body (121) while being separated from the gas diffusion space (123) and the gas outlet holes (125); and a ring-shaped dielectric member (126) which is installed to include a slot-formed region in the microwave radiation side of the antenna body (121).