METHOD OF MANUFACTURING NANO STRUCTURE AND METHOD OF FORMING A PATTERN USING IT

Provided is a method for manufacturing a nanostructure. The method for manufacturing a nanostructure according to an embodiment of the present invention comprises the steps of forming a first thin film comprising a first block copolymer on a substrate; forming guide patterns on the first thin film;...

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Bibliographische Detailangaben
Hauptverfasser:	KANG, MIN HYUCK, BANG, JOON A, LEE, JUN HAN, KWAK, EUN AE, LEE, SU MI, JUNG, HYUN JUNG, LEE, MOON GYU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY GENERAL PROCESSES OF COMPOUNDING HOLOGRAPHY MANUFACTURE OR TREATMENT THEREOF MATERIALS THEREFOR METALLURGY NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS NANOTECHNOLOGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING-UP
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Beschreibung
Zusammenfassung:	Provided is a method for manufacturing a nanostructure. The method for manufacturing a nanostructure according to an embodiment of the present invention comprises the steps of forming a first thin film comprising a first block copolymer on a substrate; forming guide patterns on the first thin film; forming a second thin film including a second block copolymer between the guide patterns; and curing the second thin film, wherein the first block copolymer has a cylindrical shape, and the second block copolymer has a lamellar shape.