MEMORY CELL THAT EMPLOYS A SELECTIVELY DEPOSITED REVERSIBLE RESISTANCE-SWITCHING ELEMENT AND METHODS OF FORMING THE SAME

In some aspects, a method of forming a memory cell is provided that includes forming a first conductor above a substrate; forming a diode above the first conductor; forming a reversible resistance-switching element above the first conductor using a selective deposition process; and forming a second...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SCHRICKER APRIL, HERNER S. BRAD, KONEVECKI MICHAEL
Format: Patent
Sprache:eng ; kor
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator SCHRICKER APRIL
HERNER S. BRAD
KONEVECKI MICHAEL
description In some aspects, a method of forming a memory cell is provided that includes forming a first conductor above a substrate; forming a diode above the first conductor; forming a reversible resistance-switching element above the first conductor using a selective deposition process; and forming a second conductor above the diode and the reversible resistance-switching element. Numerous other aspects are provided.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20140061468A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20140061468A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20140061468A3</originalsourceid><addsrcrecordid>eNqNjDEKwkAURNNYiHqHD9aBRIPYrpuJWdzNyv5PJJWIrJVoIBYe3wgewGoG3ryZJm8H50NHGtaS1EoI7mh9x6SIYaHFtLAdlTh6NoKSAloENjuLsbJhUY1GyicjujbNnkbJoRFSTUkOUvuSyVdU-eC-WGoQK4d5Mrld7kNc_HKWLCuMF2nsn-c49JdrfMTX-RBWWV5k2SYvNlu1_m_1AaFnOvk</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MEMORY CELL THAT EMPLOYS A SELECTIVELY DEPOSITED REVERSIBLE RESISTANCE-SWITCHING ELEMENT AND METHODS OF FORMING THE SAME</title><source>esp@cenet</source><creator>SCHRICKER APRIL ; HERNER S. BRAD ; KONEVECKI MICHAEL</creator><creatorcontrib>SCHRICKER APRIL ; HERNER S. BRAD ; KONEVECKI MICHAEL</creatorcontrib><description>In some aspects, a method of forming a memory cell is provided that includes forming a first conductor above a substrate; forming a diode above the first conductor; forming a reversible resistance-switching element above the first conductor using a selective deposition process; and forming a second conductor above the diode and the reversible resistance-switching element. Numerous other aspects are provided.</description><language>eng ; kor</language><subject>ELECTRICITY</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20140521&amp;DB=EPODOC&amp;CC=KR&amp;NR=20140061468A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20140521&amp;DB=EPODOC&amp;CC=KR&amp;NR=20140061468A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHRICKER APRIL</creatorcontrib><creatorcontrib>HERNER S. BRAD</creatorcontrib><creatorcontrib>KONEVECKI MICHAEL</creatorcontrib><title>MEMORY CELL THAT EMPLOYS A SELECTIVELY DEPOSITED REVERSIBLE RESISTANCE-SWITCHING ELEMENT AND METHODS OF FORMING THE SAME</title><description>In some aspects, a method of forming a memory cell is provided that includes forming a first conductor above a substrate; forming a diode above the first conductor; forming a reversible resistance-switching element above the first conductor using a selective deposition process; and forming a second conductor above the diode and the reversible resistance-switching element. Numerous other aspects are provided.</description><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjDEKwkAURNNYiHqHD9aBRIPYrpuJWdzNyv5PJJWIrJVoIBYe3wgewGoG3ryZJm8H50NHGtaS1EoI7mh9x6SIYaHFtLAdlTh6NoKSAloENjuLsbJhUY1GyicjujbNnkbJoRFSTUkOUvuSyVdU-eC-WGoQK4d5Mrld7kNc_HKWLCuMF2nsn-c49JdrfMTX-RBWWV5k2SYvNlu1_m_1AaFnOvk</recordid><startdate>20140521</startdate><enddate>20140521</enddate><creator>SCHRICKER APRIL</creator><creator>HERNER S. BRAD</creator><creator>KONEVECKI MICHAEL</creator><scope>EVB</scope></search><sort><creationdate>20140521</creationdate><title>MEMORY CELL THAT EMPLOYS A SELECTIVELY DEPOSITED REVERSIBLE RESISTANCE-SWITCHING ELEMENT AND METHODS OF FORMING THE SAME</title><author>SCHRICKER APRIL ; HERNER S. BRAD ; KONEVECKI MICHAEL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20140061468A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2014</creationdate><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>SCHRICKER APRIL</creatorcontrib><creatorcontrib>HERNER S. BRAD</creatorcontrib><creatorcontrib>KONEVECKI MICHAEL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHRICKER APRIL</au><au>HERNER S. BRAD</au><au>KONEVECKI MICHAEL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MEMORY CELL THAT EMPLOYS A SELECTIVELY DEPOSITED REVERSIBLE RESISTANCE-SWITCHING ELEMENT AND METHODS OF FORMING THE SAME</title><date>2014-05-21</date><risdate>2014</risdate><abstract>In some aspects, a method of forming a memory cell is provided that includes forming a first conductor above a substrate; forming a diode above the first conductor; forming a reversible resistance-switching element above the first conductor using a selective deposition process; and forming a second conductor above the diode and the reversible resistance-switching element. Numerous other aspects are provided.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng ; kor
recordid cdi_epo_espacenet_KR20140061468A
source esp@cenet
subjects ELECTRICITY
title MEMORY CELL THAT EMPLOYS A SELECTIVELY DEPOSITED REVERSIBLE RESISTANCE-SWITCHING ELEMENT AND METHODS OF FORMING THE SAME
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T15%3A51%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SCHRICKER%20APRIL&rft.date=2014-05-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20140061468A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true