SUBSTRATE PROCESSING APPARATUS

Disclosed is a substrate processing apparatus capable of easily replacing and maintaining a sensor for measuring thickness of a thin film being deposited during a deposition process. The substrate processing apparatus disclosed comprises: a transport unit which moves a sensor for measuring thickness...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	GONG, DOO WON, YANG, HO SIK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Disclosed is a substrate processing apparatus capable of easily replacing and maintaining a sensor for measuring thickness of a thin film being deposited during a deposition process. The substrate processing apparatus disclosed comprises: a transport unit which moves a sensor for measuring thickness of a thin film being deposited by a deposition apparatus to the outside through a side wall of a deposition chamber; and a door installed to be able to open/close on one side wall of the deposition chamber. Thus, a sensor for measuring a quantity of evaporation can be replaced and maintained easily without any safety accident since the sensor can be moved to the outside through one side of the deposition chamber.