METHOD FOR APPLYING INERT GAS TO STB IN SEMICONDUCTOR WAFER PRODUCT SYSTEM AND SEMICONDUCTOR WAFER PRODUCT SYSTEM USING THE SAME

The present invention relates to a method for supplying inert gas to a side track buffer (STB) in a semiconductor wafer manufacturing system and a semiconductor wafer manufacturing system using the same, which comprise a step of generating a first input signal by sensing the loading of a front openi...

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Bibliographische Detailangaben
Hauptverfasser:	LEE, JUN HAN, JEONG, UI HAN, LEE, JAE HYEON, YU, DONG GYU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Beschreibung
Zusammenfassung:	The present invention relates to a method for supplying inert gas to a side track buffer (STB) in a semiconductor wafer manufacturing system and a semiconductor wafer manufacturing system using the same, which comprise a step of generating a first input signal by sensing the loading of a front opening unified POD (FOUP) in an STB; and a step of supplying nitrogen gas to the STB by opening an inert gas valve based on the first input signal.