LIQUID LEVEL DETECTION DEVICE, GLASS MANUFACTURING DEVICE, LIQUID LEVEL DETECTION METHOD, AND GLASS MANUFACTURING METHOD

A liquid level detection device (200) detects the level (L) of molten glass (102) contained within a melting tank (110). The liquid level detection device (200) comprises a camera (210) which captures the image of at least a part of each of the following objects: reference lines (151a, 152a) formed...

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Bibliographische Detailangaben
Hauptverfasser:	KAKEGAWA YUKIHIDE, KURUMISAWA MAKOTO, NAKATSUKA EIJI, SHINOHARA YOSHIHARU, AKAGI RYOSUKE, OHNISHI KOJI, UCHIDA KOHEI, EZURE MASANOBU, OKA MASAHIRO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BLASTING CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS,IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KINDOF FURNACE FURNACES GLASS HEATING JOINING GLASS TO GLASS OR OTHER MATERIALS KILNS LIGHTING MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES MEASURING MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL MECHANICAL ENGINEERING METALLURGY METERING BY VOLUME MINERAL OR SLAG WOOL OVENS PHYSICS RETORTS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS TESTING WEAPONS
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Beschreibung
Zusammenfassung:	A liquid level detection device (200) detects the level (L) of molten glass (102) contained within a melting tank (110). The liquid level detection device (200) comprises a camera (210) which captures the image of at least a part of each of the following objects: reference lines (151a, 152a) formed on the inner wall surface (150) of a glass melting furnace (100); the side wall section (111) of the melting tank (110); and the surface (103) of molten glass (102). The liquid level detection device (200) also comprises an image processing device (220) which processes an image (270P) captured by the camera (210). Thus the liquid level detection device (200) detects the positional relationship in the image (270P) between the reference lines (151a, 152a), the side wall section (111), and the surface (103) and then detects the level (L) on the basis of the detected positional relationship and of the actual positional relationship between the reference lines (151a, 152a).