A METHOD FOR PREPARING MONO-SILANE BY USING TRIALKOXYSILANE

The present invention relates to a production method of monosilane, and more specifically, to an economic production method of monosilane which produces the monosilane with high purity and high yield using trialkoxysilane, thereby practically using the monosilane for the composition of a thin semico...

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Bibliographische Detailangaben
Hauptverfasser:	SALIKHOV SHAVKAT, ASHUROVA KHEKAYAT, KIM, DEOK YUN, ASHUROV RUSTAM, KIM, TAEK JOONG, KIM, YONG IL, KURBANOV AZIZ, AZIZOV SULTAN, KIM, KYUNG YEOL, ASHUROV KHATAM, ABDISAIDOV ILYOS, ROTSHTEYN VLADIMIR
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOUNDS THEREOF INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention relates to a production method of monosilane, and more specifically, to an economic production method of monosilane which produces the monosilane with high purity and high yield using trialkoxysilane, thereby practically using the monosilane for the composition of a thin semiconductor structure or a multipurpose high purity polycrystalline silicone. 본 발명은 모노실란의 제조방법에 관한 것으로서, 더욱 상세하게는 트리알콕시실란을 이용하여 고순도와 고수율로 모노실란을 제조함으로써, 얇은 반도체 구조의 조성 및 다목적의 고순도 다결정 실리콘에 유용한 모노실란을 경제적으로 제조방법에 관한 것이다.