SUBSTRATE INSPECTION APPARATUS AND METHOD WITH HIGH RESOLUTION

The present invention relates to a substrate inspection apparatus with high resolution and an inspection method thereof which can realize highly improved resolution and deep depth even using the conventional lens at low costs as it is. The substrate inspection apparatus with high resolution comprises: an imaging device which obtains an image by scanning a substrate; a pixel shifting unit which moves the pixel of the imaging device to a fixed distance when a first image is obtained by scanning the substrate; the imaging device which obtains a second image by scanning again the substrate corresponding to the first image through the pixel moved by the pixel shifting unit; and an image interpreting unit which calculates the position of the size of a defect using the pixel value of the defect becoming an image in the first image and the pixel value of the defect becoming an image in the second image.