METHOD AND SYSTEM FOR CONVERGENT POLISHING

A method of mounting a workpiece to a substrate is disclosed, the method comprising: determining a peak-to-valley height value; determining a value related to pitch area; computing a relative area of pitch; computing a button radius; computing a number of pitch buttons; coupling the computed number,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	GERAGHTY PAUL, STEELE WILLIAM A, DYLLA SPEARS REBECCA J, MASON DANIEL C, MILLER PHILIP E, SURATWALA TAYYAB I, WONG LANA L, FEIT MICHAEL D, DESJARDIN RICHARD P, BUDE JEFFREY D
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	A method of mounting a workpiece to a substrate is disclosed, the method comprising: determining a peak-to-valley height value; determining a value related to pitch area; computing a relative area of pitch; computing a button radius; computing a number of pitch buttons; coupling the computed number, N, of pitch buttons to the workpiece; and coupling the N pitch buttons to the substrate. Also disclosed is a slurry system for polishing an optical element, the slurry system comprising: a solvent; an abrasive component supported in the solvent; and a surfactant supported in the solvent.