MANUFACTURING METHOD OF HIGH DENSITY TARGET, UTILIZING WASTE TARGETS CONSISTING OF GALLIUM OXIDE AND INDIUM OXIDE

The present invention relates to a method for simply manufacturing a high density sputtering target in a high recovery rate by recycling a water target comprised of gallium oxide and indium oxide used for conductive element materials for display and applying only dry processes without wet dissolutio...

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Bibliographische Detailangaben
Hauptverfasser:	KANG, MIN HO, YANG, SEUNG HO, YOON, WON KYU, LIM, SUN KWON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY REFRACTORIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE
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Beschreibung
Zusammenfassung:	The present invention relates to a method for simply manufacturing a high density sputtering target in a high recovery rate by recycling a water target comprised of gallium oxide and indium oxide used for conductive element materials for display and applying only dry processes without wet dissolution processes. Moreover, the preset invention relates to a method for manufacturing a target in lower sintering temperature in comparison with an existing method by manufacturing the target by using a sintering aid.