SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

A semiconductor device in the present invention includes a semiconductor layer; a gate electrode which covers the end of the semiconductor layer; and an insulation layer which insulates the semiconductor layer and the gate electrode. The thickness of the insulation layer which insulates the area whe...

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Bibliographische Detailangaben
Hauptverfasser: TANADA YOSHIFUMI, TAKAHASHI SYUHEI, SUZUKI YUKIE, MORIYA YOSHITAKA, YAMAZAKI SHUNPEI, ARAI YASUYUKI, IKEDA KAZUKO
Format: Patent
Sprache:eng ; kor
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