APPARATUS FOR SUBSTRATE TREATMENT

The present invention relates to a substrate processing apparatus. Particularly, the substrate processing apparatus performs a thermal process on the substrate of a flat display panel. The substrate processing apparatus according to the embodiment of the present invention includes a process chamber...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KIM, CHUL SOO, CHOI, SEUNG AE, LIM, LI HWAN, SHIM, JANG WOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The present invention relates to a substrate processing apparatus. Particularly, the substrate processing apparatus performs a thermal process on the substrate of a flat display panel. The substrate processing apparatus according to the embodiment of the present invention includes a process chamber having a substrate processing space, a heating lamp generating radiation energy, a heating housing with a reflection block for reflecting the radiation energy generated from the heating lamp, a window sealing between the heating housing and the process chamber and transmitting the radiation energy to the substrate.