WAFER ETCHING APPARATUS FOR MANUFACTURING SOLAR CELL

The present invention relates to a substrate etching device for manufacturing solar cells and includes a bath which accommodates the etching chemical; and multiple rollers which are placed inside the bath, transfer a substrate in a certain direction, and apply the etching chemical on the bottom surface of the substrate. By applying the etching chemical on the bottom surface of the substrate, a semiconductor layer formed on the bottom of the substrate is removed through a diffusion process during the manufacturing of a solar cell, and an isolation process can be performed by removing only part of the semiconductor layer formed on the lateral side of the substrate. As a result, removal of a semiconductor layer formed on the top of the substrate is prevented during a wet isolation process, and thus damage to an effective light receiving surface on the top of the substrate is prevented. [Reference numerals] (AA) Etching chemical