INFRARED ABSORBING GLASS WAFER AND METHOD FOR PRODUCING SAME

PURPOSE: An infrared absorption glass wafer and a manufacturing method thereof are provided to reduce manufacturing spaces and costs by simplifying manufacturing processes. CONSTITUTION: A camera sensor (22) is arranged on a semiconductor wafer (12). A glass wafer (1) is combined with the semiconduc...

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Bibliographische Detailangaben
Hauptverfasser:	SCHREDER BIANCA, BAUR CHRISTOPHE, MARTIN CLAUDE, REICHESL STEFFEN, CLEMENT MARC, FREUND JOCHEN, WOELFEL UTE
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHOTOGRAPHY PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: An infrared absorption glass wafer and a manufacturing method thereof are provided to reduce manufacturing spaces and costs by simplifying manufacturing processes. CONSTITUTION: A camera sensor (22) is arranged on a semiconductor wafer (12). A glass wafer (1) is combined with the semiconductor wafer. A camera chip includes the camera sensor. The camera chip is separated from a wafer assembly. An infrared filter is deposited on a window.