METHOD AND APPARATUS FOR DETECTING PATTERN DEFECTS

PURPOSE: A pattern defect detection method and an apparatus thereof obtains a minimum distance between a reference pattern and a test pattern by using a pre-generated distance map, detecting a fault of a pattern according to a user's request. CONSTITUTION: A pattern form having extraction of an outline of a reference pattern and a test pattern from a reference image and a test image is obtained (S401, S402). The reference pattern outline and the test pattern layout obtained are place-arranged. In every position where an outline pixel of a test pattern form, the minimum distance between a pixel of each position and an outline pixel of a reference pattern image is calculated, and a distance map having a distance map value as the calculated minimum distance is generated. A fault in form of the test pattern is detected based on the minimum distance between an outline pixel of the test pattern form obtained by using the distance map and an outline pixel of the reference pattern form. [Reference numerals] (AA) Reference image; (BB) Test image; (S401) Obtain a pattern area (R_B) and a pattern form (B); (S402) Obtain a pattern area (R_A) and a pattern form (A); (S403) Obtain a center of gravity (P_B); (S404) Obtain a center of gravity (P_A); (S406) Identify the disposition; (S407) Obtain d(a,B)