SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD

PURPOSE: A surface treating agent and a surface treating method using the same are provided to prevent the fall of a pattern and to reduce a force between the patterns in a drying process. CONSTITUTION: A surface treating contains a compound which is indicated as a first formula (1) or a second form...

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Hauptverfasser: OHHASHI TAKUYA, SUGAWARA MAI
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Sprache:eng ; kor
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creator OHHASHI TAKUYA
SUGAWARA MAI
description PURPOSE: A surface treating agent and a surface treating method using the same are provided to prevent the fall of a pattern and to reduce a force between the patterns in a drying process. CONSTITUTION: A surface treating contains a compound which is indicated as a first formula (1) or a second formula (2). The first formula is R^1aSi[N(CH3)2]4-a. The second formula is R^2b[N(CH3)2]3-bSi-R^4-SiR$3c[N(CH3)2]3-c. R^1 is the chain aliphatic hydrocarbon group of the carbon number 1-18. a is 1 or 2. b and c are 1. R^4 is a chain alkylene group. R^2 and R^3 are a hydrogen atom or a methyl group.
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language eng ; kor
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subjects ADHESIVES
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
CINEMATOGRAPHY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
CORRECTING FLUIDS
DYES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
FILLING PASTES
HOLOGRAPHY
INKS
MATERIALS THEREFOR
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORIGINALS THEREFOR
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
POLISHES
SEMICONDUCTOR DEVICES
USE OF MATERIALS THEREFOR
WOODSTAINS
title SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD
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