POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION
PURPOSE: A positive photosensitive resin composition is provided to be able to show an excellent cyclization rate by a low temperature curing reaction, and, therefore, to be able to manufacture a photosensitive resin film with an excellent mechanical property and insulation property. CONSTITUTION: A...
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| creator | HWANG, EUN HA LEE, JIN YOUNG KIM, SANG KYEON LEE, JUN HO CHO, HYUN YONG KWON, JI YUN KIM, SANG SOO LEE, JONG HWA KIM, DAE YUN YOON, EUN KYUNG HONG, CHUNG BEOM |
| description | PURPOSE: A positive photosensitive resin composition is provided to be able to show an excellent cyclization rate by a low temperature curing reaction, and, therefore, to be able to manufacture a photosensitive resin film with an excellent mechanical property and insulation property. CONSTITUTION: A positive photosensitive resin composition comprises (A) alkali soluble resin selected from a polybenzoxazole precursor, and a polyimide precursor or their combination; (B) a photosensitive diazoquinone compound; (B) a thermoacid generator with a decomposition temperature of 150-200deg.C; and (D) a solvent. The polybenzoxazole precursor includes a repeating unit represented by Chemical formula 1, or both repeating units of Chemical formulas 1 and 2, and has a thermally polymerizable functional group on at least one terminal end. |
| format | Patent |
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| language | eng ; kor |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION |
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