METHOD OF FABRICATING FRINGE FIELD SWITCHING LIQUID CRYSTAL DISPLAY DEVICE

PURPOSE: A method for fabricating a fringe field switching liquid crystal display device is provided to pattern a gate line and a pixel electrode(or common electrode) at the same time by using a halftone mask, and to pattern a date line, a protection layer, and the common electrode(or the pixel elec...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, EUNG YONG, AHN, SUNG HOON, KU, SUN JU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PURPOSE: A method for fabricating a fringe field switching liquid crystal display device is provided to pattern a gate line and a pixel electrode(or common electrode) at the same time by using a halftone mask, and to pattern a date line, a protection layer, and the common electrode(or the pixel electrode) at the same time by a lift off process, and to reduce the number of masks. CONSTITUTION: A gate electrode(121) and a gate line are formed while the first electrode is formed on the pixel of a first substrate(110) by a first mask process. An active layer(124) is formed in the pixel by a second mask process. A source electrode(122), a drain electrode(123), and a data line (117) are formed while a second electrode(108) is formed on the pixel by a third mask process. As a photoresist layer pattern and an insulating layer(115a) are selectively removed by a lift off process, a protection layer is formed.