VERTICAL CVD APPARATUS

PURPOSE: A vertical CVD(Chemical Vapor Deposition) device is provided to uniformly and effectively form a thin film for multiple processed objects by including a supply gas path injector in a dual cooling structure. CONSTITUTION: An induction heating coil part(1) surrounds the circumference of a pro...

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Bibliographische Detailangaben
Hauptverfasser:	LIM, HYO NAM, YOUN, HAE SANG, LEE, YOUNG CHAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PURPOSE: A vertical CVD(Chemical Vapor Deposition) device is provided to uniformly and effectively form a thin film for multiple processed objects by including a supply gas path injector in a dual cooling structure. CONSTITUTION: An induction heating coil part(1) surrounds the circumference of a processing container. An injector(2) supplies processing gas to the processing container. A processing gas path is formed in the longitudinal direction and receives the processing gas. Multiple processing gas outputs are formed along the processing gas path to supply the process gas to the multiple processed objects. A cooling gas supply path surrounds the processing gas path and receives cooling gas. A cooling gas exhaust path surrounds the cooling gas supply path, is connected to the end of the cooling gas supply path, and exhausts the cooling gas.