SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

PURPOSE: A substrate processing apparatus is provided to prevent the damage of a support shaft or a susceptor, the generation of particles due to the thermal expansion of the susceptor by reducing the frictional force between the upper surface of the support shaft and the lower surface of the suscep...

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Hauptverfasser: YUN, HEE DONG, MA, HEE JEON, NOH, DONG MIN, KIM, SOO CHEON, HA, JOO IL
Format: Patent
Sprache:eng ; kor
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator YUN, HEE DONG
MA, HEE JEON
NOH, DONG MIN
KIM, SOO CHEON
HA, JOO IL
description PURPOSE: A substrate processing apparatus is provided to prevent the damage of a support shaft or a susceptor, the generation of particles due to the thermal expansion of the susceptor by reducing the frictional force between the upper surface of the support shaft and the lower surface of the susceptor. CONSTITUTION: A susceptor(30) has a flat shape and is arranged in a chamber(10). A gas ejector(20) sprays gas to a substrate held by the susceptor. A susceptor elevating shaft(40) is combined with the susceptor to raise the susceptor. A supporting shaft(50A) is separated from each other in the edge of the susceptor. A bellows(B) is installed in the susceptor elevating shaft and a support shaft.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title SUBSTRATE PROCESSING APPARATUS
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