FLUIDIZED BED REACTOR FOR PRODUCTION OF A GRANULAR POLYSILICON

PURPOSE: A fluidized bed reactor for the manufacture of particle type silicon is provided to be operated continuously by having silicon not precipitated or accumulated in the reactor inner wall and heater. CONSTITUTION: A fluidized bed reactor comprises a fluidized reactor, a gas supplying unit, a r...

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Bibliographische Detailangaben
Hauptverfasser:	CHUNG, YOON SUB, KWON, HYUN GOO, SON, MIN SOO, YOON, YEO KYUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF CRYSTAL GROWTH DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	PURPOSE: A fluidized bed reactor for the manufacture of particle type silicon is provided to be operated continuously by having silicon not precipitated or accumulated in the reactor inner wall and heater. CONSTITUTION: A fluidized bed reactor comprises a fluidized reactor, a gas supplying unit, a reactant gas supplying unit, and a heating unit. The gas supplying unit supplies the flowing gas at the lower part of the silicon seed layer formed inside the reactor. The reactant gas supplying unit supplies the reaction gas necessary to the precipitation of silicon into inside the silicon seed layer. The outlet of the reactant gas supplying unit is formed to discharge the reactant gas in 0-60 degrees range based on the virtual horizontal line.