LITHOGRAPHIC APPARATUS AND METHOD FOR ILLUMINATION UNIFORMITY CORRECTION AND UNIFORMITY DRIFT COMPENSATION
PURPOSE: A lithography apparatus, a manufacturing method of the device, and a uniformity correction system are provided to be able to compensate the uniformity drift caused by the illumination beam movement, the optical column uniformity, the uniformity compensator drift etc. CONSTITUTION: A lithogr...
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Sprache: | eng ; kor |
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Zusammenfassung: | PURPOSE: A lithography apparatus, a manufacturing method of the device, and a uniformity correction system are provided to be able to compensate the uniformity drift caused by the illumination beam movement, the optical column uniformity, the uniformity compensator drift etc. CONSTITUTION: A lithography apparatus comprises an illumination system conditioning the radiation beams; a support structure maintaining a patterning device configured to pattern the conditioned radiation beams; a projection system reflecting the patterned radiation beams onto the target portion of a substrate; and a substrate table. A lighting system comprises a uniformity correction system located in the plane configured to accommodate a certain pupil in the case the radiation beams illuminate. A uniformity correction system comprises fingers(708) and actuating devices moving each finger. The fingers are able to move into and out of the intersection with a radiation beam in order to correct the intensity of each part of the incident radiation beams on fingers. Each actuating device is coupled with a corresponding finger among the fingers containing a single tip with the same width to each actuating device width, or coupled with a corresponding finger among the fingers containing a single tip with a smaller width than each actuating device width based on the position of the uniformity correction system to the field plane of the illumination system. |
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