IMPROVED APPARATUS, SYSTEM AND METHOD OF INSPECTING TOP-LAYER PATTERNS OF MULTI-LAYER STRUCTURE

PURPOSE: A device for inspecting upper layer patterns of an improve multilayer structure, a system, and a method thereof are provided to utilize a difference of ultraviolet radiation amount of the upper layer electrode patterns and an insulating layer, thereby inspecting upper layer patterns accurat...

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Bibliographische Detailangaben
Hauptverfasser:	HAN, SUN GU, NAMGUNG, KEE
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	PURPOSE: A device for inspecting upper layer patterns of an improve multilayer structure, a system, and a method thereof are provided to utilize a difference of ultraviolet radiation amount of the upper layer electrode patterns and an insulating layer, thereby inspecting upper layer patterns accurately and precisely. CONSTITUTION: A device(200) for inspecting upper layer patterns of an improve multilayer structure comprises an optical member(210), an ultraviolet-ray LED lighting member(220), and a camera(230). The ultraviolet-ray LED lighting member emits ultraviolet-rays. The ultraviolet-ray LED lighting member includes an illumination control member(250). The camera is arranged on the top of the optical member.