DEVICE AND METHOD FOR SUBSTRATE PROCESSING

Device for processing a substrate in a processing plant, comprises at least one process tool (3) exhibiting two oppositely arranged substrate planes, that are oriented at least approximately perpendicular, and arranged in at least one processing area (2). The device is adapted for processing at leas...

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Bibliographische Detailangaben
Hauptverfasser:	HARTWICH JESSICA, KARG FRANZ
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONVEYING DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GLASS HANDLING THIN OR FILAMENTARY MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL PACKING PERFORMING OPERATIONS PNEUMATIC TUBE CONVEYORS SEMICONDUCTOR DEVICES SHOP CONVEYOR SYSTEMS STORING SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING TRANSPORTING
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Beschreibung
Zusammenfassung:	Device for processing a substrate in a processing plant, comprises at least one process tool (3) exhibiting two oppositely arranged substrate planes, that are oriented at least approximately perpendicular, and arranged in at least one processing area (2). The device is adapted for processing at least two substrates simultaneously in the processing area with the process tool. The substrates are arranged in the substrate planes such that the coatings of the substrates face each other and a quasi-closed process space is formed between the substrates at least during the processing. An independent claim is also included for processing coated substrates in a processing plant comprising at least two substrates in the processing area arranged in the oppositely arranged substrate planes, where the substrate exhibits coatings.