ON-SITE RECYCLING SYSTEM FOR THE HIGH EFFICIENT RECOVERY OF WASTE GENERATING FROM GLASS ETCHING PROCESS

PURPOSE: An on-site recycling method in a glass etching process is provided to recycle waste acid mixtures generated in a glass-etching process and to remarkably reduce the amount of an etching liquid used. CONSTITUTION: An on-site recycling method in a glass etching process comprises as follows: a...

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Hauptverfasser: KIM, JIN WON, LEE, EUL GYU, PARK, A RONG, HAN, BYEONG HYEON, JIONG, YOUNG SU, KWON, WON KEUN, SEOL, TAE JOON, ROH, CHI HYEONG, YANG, MIN HO
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:PURPOSE: An on-site recycling method in a glass etching process is provided to recycle waste acid mixtures generated in a glass-etching process and to remarkably reduce the amount of an etching liquid used. CONSTITUTION: An on-site recycling method in a glass etching process comprises as follows: a slurry removing step of filtering waste etching liquid with a filter, which is generated after etching a glass sheet using a etching liquid; an acid collecting step of allowing the waste etching liquid to pass through a diffusion dialysis apparatus and/or an ion exchange resin column in order to collect acid in the waste etching liquid; and a blending step of adding scarce components to the acid and blending in the mixing ratio same as the etching liquid. [Reference numerals] (AA) Waste liquid bath; (BB) Etching process; (CC) Filter; (DD) Sludge; (EE) Pure water storage bath; (FF) Waste mixed acid storage bath; (GG,QQ) Storage bath; (HH) Solid part extraction; (II) Liquid adjusting bath; (JJ) Diffusion dialysis device; (KK) Flash distillation; (LL) Wastewater; (MM) Collected mixed acid; (NN) Distributor; (OO) Ion exchange resin column; (PP) Ion exchange resin auxiliary column